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Determination of the X-Auger electron spectroscopy evolution of indium in InSb by linear and nonlinear least squares approaches

X射线光电子能谱 俄歇电子能谱 螺旋钻 非线性最小二乘法 分析化学(期刊) 半导体 光谱学 非线性系统 化学 计算物理学 材料科学 物理 原子物理学 光电子学 数学 算法 量子力学 估计理论 核磁共振 色谱法
作者
Solène Béchu,Neal Fairley
出处
期刊:Journal of vacuum science & technology [American Institute of Physics]
卷期号:42 (1) 被引量:4
标识
DOI:10.1116/6.0003086
摘要

X-ray photoelectron spectroscopy is a major and valuable chemical analysis technique that can bring a wide range of information if one takes time to carefully interpret the spectra. In particular, many metrological developments deal with the modeling of photoelectron peaks while X-Auger transitions still remain hardly exploited. Here, an innovative approach examining these spectral features in a complementary way is presented and illustrated on a concrete case dealing with chemical changes of indium in the InSb semiconductor during its air aging. Indium contains an extensive range of photopeaks along the energy scale, meaning electrons emitted from different escape depths are present on the same widescan spectrum, and, thus, information from different depths is accessible. Specifically, this study focuses on indium’s X-Auger electron spectroscopy (X-AES) transitions and decomposition to track the outer surface chemistry evolution of the InSb semiconductor. To this end, we compared linear and nonlinear least-squares approaches to decompose In M4,5N4,5N4,5 X-AES transition and demonstrate oxide growth progression. For both approaches, we applied the vectorial method (also known as the informed amorphous sample model) to retrieve the different chemical environments present during air aging. Linear and nonlinear least-squares approaches were both found to yield comparable results, with a comparative error of less than 10%. Over time, a progressive growth of the oxide layer was demonstrated, ranging from 0.3 ± 0.2 to 2.9 ± 0.2 nm using the X-AES transitions. Additionally, decomposition of the In 3d and In 4d photoelectron peaks showed a lower thickness of oxide with time due to the lesser surface sensitivity of these peaks.
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