降级(电信)
材料科学
栅氧化层
MOSFET
光电子学
加速老化
氧化物
工程物理
电子工程
可靠性工程
晶体管
电气工程
工程类
冶金
复合材料
电压
标识
DOI:10.1016/j.microrel.2020.113777
摘要
Abstract In this paper, a method for the condition monitoring of the gate-oxide degradation in silicon carbide (SiC) metal-oxide-semiconductor–field-effect transistors (MOSFETs) is presented. To identify the gate-oxide degradation in SiC MOSFETs, a high-temperature gate bias (HTGB) test, which is an accelerated aging test, is usually performed. This paper proposes an advanced HTGB test for power devices. The test is suitable for developing a condition monitoring system for power devices because the test can accelerate the device aging under switching conditions. Electrical parameter changes in the SiC MOSFETs are demonstrated in the test results. Furthermore, a condition monitoring technique using the input capacitance Ciss change of the SiC MOSFETs is proposed.
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