铀
X射线光电子能谱
二氧化铀
杂质
化学计量学
材料科学
铀酰
无机化学
放射化学
氟化物
核化学
化学
冶金
化学工程
有机化学
工程类
作者
Xu Feng,Brendan D’Souza,Jinsuo Zhang
摘要
XPS was performed on as-received and Ar+-sputtered uranium tetrafluoride (UF4) powder. The as-received powder surface exhibits stoichiometric UF4 with hydrocarbon contamination and surface impurities of uranium dioxide (UO2) and uranyl fluoride (UO2F2). Sputtering removes a majority of surface contamination and impurities, while also partially reduces the powder surface to uranium trifluoride (UF3).
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