带隙
渗氮
电子结构
密度泛函理论
猝灭(荧光)
氮气
接受者
结合能
材料科学
兴奋剂
巴(单位)
电子能带结构
化学
无机化学
计算化学
化学物理
原子物理学
凝聚态物理
有机化学
光电子学
气象学
量子力学
荧光
物理
作者
Jonathan M. Polfus,Tor S. Bjørheim,Truls Norby,Reidar Haugsrud
摘要
The nitrogen related defect chemistry and electronic structure of wide band gap oxides are investigated by density functional theory defect calculations of NqO, NH×O, and as well as and in MgO, CaO, SrO, Al2O3, In2O3, Sc2O3, Y2O3, La2O3, TiO2, SnO2, ZrO2, BaZrO3, and SrZrO3. The NqO acceptor level is found to be deep and the binding energy of NH×O with respect to and is found to be significantly negative, i.e. binding, in all of the investigated oxides. The defect structure of the oxides was found to be remarkably similar under reducing and nitriding conditions (1 bar N2, 1 bar H2 and 1 × 10−7 bar H2O): NH×O predominates at low temperatures and predominates at higher temperatures (>900 K for most of the oxides). Furthermore, we evaluate how the defect structure is affected by non-equilibrium conditions such as doping and quenching. In terms of electronic structure, is found to introduce isolated N-2p states within the band gap, while the N-2p states of NH×O are shifted towards, or overlap with the VBM. Finally, we assess the effect of nitrogen incorporation on the proton conducting properties of oxides and comment on their corrosion resistance in nitriding atmospheres in light of the calculated defect structures.
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