防反射涂料
材料科学
红豆
折射率
薄膜
溶胶凝胶
涂层
透射率
图层(电子)
表面改性
接触角
化学工程
光学
光电子学
纳米技术
复合材料
物理
工程类
作者
Xinxiang Zhang,Shuang Cai,Dan You,Lianghong Yan,Haibing Lv,Xiaodong Yuan,Bo Jiang
标识
DOI:10.1002/adfm.201203059
摘要
Abstract A double‐layer double‐wavelength antireflective (AR) coating with 100% transmittance at both 1064 nm and 532 nm, which is very important in high power laser systems, is designed using thin film design software (TFCalc). The refractive indices for the bottom and top layers of the designed AR coating are about 1.30 and 1.14. A simple, template‐free sol‐gel route is proposed to prepare the superhydrophobic ORMOSIL (organically modified silicate) thin film, which has an ultralow refractive index, by silica particle surface modification using hexamethylisilazane (HMDS); this treatment decreases the refractive index of the silica thin film from 1.23 to 1.13. The formation mechanism of the ultralow refractive index thin film is proposed. The particle surface modification with HMDS significantly improves the hydrophobicity of the coated film; the water contact angle of the film increases from 23.4° to 160°. The bottom layer, which has a refractive index of 1.30, is prepared from acid‐catalyzed and base‐catalyzed mixed silica sol. A double‐layer silica AR coating is obtained with transmittances of 99.6% and 99.8% at 532 nm and 1064 nm, respectively.
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