计算机科学
自动光学检测
可视化
平面图(考古学)
过程(计算)
样品(材料)
采样(信号处理)
目视检查
软件检查
代表(政治)
自动X射线检查
工程制图
数据挖掘
工程类
软件
人工智能
计算机视觉
图像处理
软件开发
操作系统
滤波器(信号处理)
考古
历史
化学
政治
程序设计语言
法学
色谱法
图像(数学)
政治学
软件质量
作者
James McNames,Bruce Whitefield,David Abercrombie
标识
DOI:10.1109/asmc.2004.1309551
摘要
In-line monitoring (ILM) is frequently used in semiconductor manufacturing to identify tool faults quickly and to minimize the impact on yield. Due to the expense of ILM only a fraction of the lots processed can be inspected. In practice process engineers devise a sampling plan to select lots for inspection so that 1) the inspection coverage, defined as the proportion of tools included in the inspection sample, is roughly equal to the tool usage and 2) all tools are covered by the inspection sample. This paper describes a new graphical display of tool usage, inspection coverage, and coverage loss that enables process engineers to quickly identify problems with the sampling plan. The displays are a graphical representation of the manufacturing process between inspection steps that show tool usage, inspection coverage, and the difference between usage and coverage.
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