氮化镓
放大器
背景(考古学)
电气工程
无线电频率
足迹
计算机科学
CMOS芯片
电子工程
电信
光电子学
工程类
材料科学
纳米技术
古生物学
图层(电子)
生物
作者
Bruce Green,Karen Moore,D. Hill,Monica CdeBaca,J. Schultz
标识
DOI:10.1109/bctm.2013.6798154
摘要
Over the last decade, Gallium Nitride (GaN) has emerged as a mainstream RF technology with disruptive performance potential. Here, we present GaN technology in the context of current commercial RF communications applications as well as future applications. We show state of the art >200W, >75% efficient packaged device performance at 2.14 GHz using a 0.6 μm 48 V technology and apply the device technology to a 400 W ultra-small footprint Doherty power amplifier. We also describe extending the 0.6 μm technology to a 0.2 μm gate length that allows for higher f T that will enable future technology for high-efficiency switch-mode amplifiers.
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