电气工程
电压
图层(电子)
工程类
领域(数学)
功率(物理)
工程物理
电荷(物理)
物理
原子层沉积
光电子学
材料科学
沉积(地质)
电子工程
高压
MOSFET
低压
功率半导体器件
计算机科学
作者
Phil Rutter,Haian Lin,Zia Hossain,David Jáuregui
标识
DOI:10.1109/ispsd64561.2026.11553914
摘要
Record low specific on-resistance, Rsp, is reported for 200V (77mΩ.mm2@ 220V) and 150V (48mΩ.mm2@ 159V) rated MOSFETs surpassing the performance of field plate (FP) based devices. This has been achieved using a revolutionary method for creating asymmetrical superjunction (SJ) power devices that employ Atomic Layer Deposition (ALD) to create fixed charge within the SJ structure. Feasibility of this technique is demonstrated at voltages up to 650V.
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