绝缘栅双极晶体管
沟槽
转身(生物化学)
材料科学
晶体管
电气工程
电容
电阻率和电导率
光电子学
逻辑门
栅极电压
电压
电子工程
工程类
纳米技术
物理
电极
核磁共振
量子力学
图层(电子)
作者
Srikanth Gollapudi,Ichiro Omura
标识
DOI:10.35848/1347-4065/ad94fb
摘要
Abstract Scaled insulated gate bipolar transistors (IGBTs) show improvement in electrical performance, but their lower gate threshold voltage ( V ge (th)) causes self-turn-on issues during high dV ce / dt or di c / dt switching conditions. In this study, we examine a carrier stored trench bipolar transistor (CSTBT) with a split-gate design to address the self-turn-on issue in scaled IGBTs. The split-gate configuration, which reduces Miller capacitance, helps to overcome self-turn-on failures of scaled split-gate CSTBT; however, the issue remains when considering the resistivity of poly-Si in the split-gates into account. To address this, we propose a selective-split-gate CSTBT design that resolves self-turn-on problems, even when poly-Si resistivity is considered. TCAD (Technology Computer Aided Design) simulations show that the proposed design is very effective in preventing self-turn-on and improves V ce (sat) by 24% compared to the scaled split-gate CSTBT.
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