高电子迁移率晶体管
缓冲器(光纤)
图层(电子)
极化(电化学)
组分(热力学)
机制(生物学)
光电子学
材料科学
化学
凝聚态物理
物理
复合材料
晶体管
计算机科学
电信
电压
物理化学
热力学
量子力学
作者
Shijin Liu,Ying Wang,Xin-Xing Fei,Chenghao Yu,Haomin Guo
标识
DOI:10.1088/1361-6641/ad5580
摘要
Abstract In this paper,bulk polarization mechanism and radiation simulation of the Al component gradient buffer layer (GBL) and constant buffer layer (CBL) of p-GaN HEMT (p-GaN GBL-HEMT and p-GaN CBL-HEMT) are analyzed and studied. It is found that the p-GaN GBL-HEMT can significantly reduce the buffer leakage current. The linear gradient amplitude (the range of linear gradients of Al components vertically in the buffer) of 20%–25% Al components can significantly increase the breakdown voltage ( V BK ) of the device, up to 1312 V. Simultaneously, although the p-GaN GBL-HEMT reduces the 2DEG concentration, the device still has a specific on-resistance ( R ON,sp ) and drain saturation current ( I DS,sat ) equivalent to the p-GaN CBL-HEMT due to the conductivity modulation effect. Its Baliga figure of merit is up to 2.27 GW cm −2 . Finally, through the SEE simulation and the bulk polarization mechanism analysis, it is found that the drain transient current ( I DS,trans ) by the identical incident particles in the p-GaN GBL-HEMT is lower than that in the p-GaN CBL-HEMT, and the I DS,trans decreases with the increase of the Al components gradient amplitude. Therefore, the p-GaN GBL-HEMT provides a new idea for improving the electrical performance and SEE hardening.
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