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Chemical Vapor Deposition Growth and Applications of Two-Dimensional Materials and Their Heterostructures

异质结 纳米技术 化学气相沉积 薄脆饼 同种类的 数码产品 材料科学 光电子学 化学 物理 物理化学 热力学
作者
Zhengyang Cai,Bilu Liu,Xiaolong Zou,Hui‐Ming Cheng
出处
期刊:Chemical Reviews [American Chemical Society]
卷期号:118 (13): 6091-6133 被引量:1314
标识
DOI:10.1021/acs.chemrev.7b00536
摘要

Two-dimensional (2D) materials have attracted increasing research interest because of the abundant choice of materials with diverse and tunable electronic, optical, and chemical properties. Moreover, 2D material based heterostructures combining several individual 2D materials provide unique platforms to create an almost infinite number of materials and show exotic physical phenomena as well as new properties and applications. To achieve these high expectations, methods for the scalable preparation of 2D materials and 2D heterostructures of high quality and low cost must be developed. Chemical vapor deposition (CVD) is a powerful method which may meet the above requirements, and has been extensively used to grow 2D materials and their heterostructures in recent years, despite several challenges remaining. In this review of the challenges in the CVD growth of 2D materials, we highlight recent advances in the controlled growth of single crystal 2D materials, with an emphasis on semiconducting transition metal dichalcogenides. We provide insight into the growth mechanisms of single crystal 2D domains and the key technologies used to realize wafer-scale growth of continuous and homogeneous 2D films which are important for practical applications. Meanwhile, strategies to design and grow various kinds of 2D material based heterostructures are thoroughly discussed. The applications of CVD-grown 2D materials and their heterostructures in electronics, optoelectronics, sensors, flexible devices, and electrocatalysis are also discussed. Finally, we suggest solutions to these challenges and ideas concerning future developments in this emerging field.
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