蚀刻(微加工)
原子层沉积
沟槽
图层(电子)
材料科学
沉积(地质)
原子束
兴奋剂
梁(结构)
纳米技术
光电子学
光学
物理
生物
古生物学
沉积物
作者
Thomas E. Seidel,Michael Current
出处
期刊:Journal of vacuum science & technology
[American Institute of Physics]
日期:2020-01-10
卷期号:38 (2)
被引量:3
摘要
Processes are described for localized film deposition on the sidewalls of nonplanar structures. Limited dose atomic layer etching, angle-directed beam atomic layer etching, and limited dose and saturated dose atomic layer deposition are described as sequential processes to provide localized coatings on the bottom, or the center, or the top and bottom of 3D nonplanar features. Applications are described for film thickness adjustments on trench sidewalls and doping of finFETs.
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