光电探测器
光电子学
响应度
范德瓦尔斯力
材料科学
比探测率
光学
紫外线
探测器
二极管
串扰
异质结
发光二极管
光子学
红外线的
夜视
等离子体子
图像传感器
作者
Yuang Luo,Xiantai Tian,Weijie Liu,Yiye Yu,Maohua Chen,Shirui Zhang,Zhiwei Gao,Yufan Wei,Jiangnan Dai,Meng Peng,Changqing Chen,Feng Wu
摘要
ABSTRACT Dual color detection technology spanning from the ultraviolet (UV) to near‐infrared (NIR) regions enables the acquisition of characteristic spectral information across multiple wavebands, which is critical for imaging, autonomous driving, and object recognition. However, the widespread adoption of such photodetectors remains challenges constrained by the heteroepitaxy difficulty of different semiconductors, low detection performance especially in IR band, and severe signal crosstalk. Therefore, achieving high performance low crosstalk UV‐NIR dual color detection in a single device has become an urgent priority. Here, we demonstrate a novel UV‐NIR dual color photodetector based on a p‐GaN/MoS 2 /BP van der Waals heterojunction, featuring a vertically stacked back‐to‐back diode configuration. The back illumination structure design significantly reduces optical crosstalk. This dual color photodetector achieves a responsivity of 125 mA W −1 and a specific detectivity of 1.8 × 10 11 Jones under 365 nm illumination at 0 V bias, while delivering a responsivity of 160 mA W −1 and a detectivity of 5.1 × 10 13 Jones under 1550 nm illumination at 0 V bias. Leveraging its unique spectral response characteristics, selective UV‐IR dual color imaging has been successfully realized. Our work paves the way to develop high performance low crosstalk dual color photodetectors through the van der Waals integration of different dimensional materials.
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