Matching Repetitive Pulsed Power to Industrial Processes
作者
E.J.M. van Heesch,Keping Yan,A.J.M. Pemen,S.A. Nair,G.J.J. Winands,I. de Jong
出处
期刊:The transactions of the Institute of Electrical Engineers of Japan.A [Institute of Electrical Engineers of Japan] 日期:2004-01-01卷期号:124 (7): 607-612被引量:8
Repetitive pulsed power techniques have enormous potential for a wide range of applications, such as nano-particle and hydrogen production, gas and water processing and sterilization, and generation of X-ray, EUV, and high-power acoustics. This paper presents the state of the art of our activities on repetitive ultra-short and microsecond pulsed power sources, pulsed thermal and streamer corona plasmas. Critical circuit elements are heavy-duty thyristors, transmission line transformers, and triggered spark-gap switches.