绝缘体上的硅
计算机科学
电气工程
材料科学
光电子学
工程类
硅
作者
Fukashi Morishita,Hideyuki Noda,Izumi Hayashi,Takayuki Gyohten,Masanori Okamoto,T. Ippōshi,S. Maegawa,K. Dosaka,Kazutami Arimoto
标识
DOI:10.1093/ietele/e90-c.4.765
摘要
We propose a novel capacitorless twin-transistor random access memory (TTRAM). The 2Mb test device has been fabricated on 130nm SOI-CMOS process. We demonstrate the TTRAM cell has two data-storage states and confirm the data retention time of 100 ms at 80°C. TTRAM process is compatible with the conventional SOI-CMOS and never requires any additional processes. A 6.1 ns row-access time is achieved and 250 MHz operation can be realized by using 2 bank 8 b-burst mode.
科研通智能强力驱动
Strongly Powered by AbleSci AI