光电子学
材料科学
共发射极
钝化
太阳能电池
硅
多晶硅
非晶硅
载流子寿命
量子点太阳电池
氧化物
单晶硅
异质结
聚合物太阳能电池
晶体硅
纳米技术
图层(电子)
薄膜晶体管
冶金
作者
Frank Feldmann,Maik Simon,Martin Bivour,Christian Reichel,Martin Hermle,Stefan W. Glunz
摘要
Carrier-selective contacts (i.e., minority carrier mirrors) are one of the last remaining obstacles to approaching the theoretical efficiency limit of silicon solar cells. In the 1980s, it was already demonstrated that n-type polysilicon and semi-insulating polycrystalline silicon emitters form carrier-selective emitters which enabled open-circuit voltages (Voc) of up to 720 mV. Albeit promising, to date a polysilicon emitter solar cell having a high fill factor (FF) has not been demonstrated yet. In this work, we report a polysilicon emitter related solar cell achieving both a high Voc = 694 mV and FF = 81%. The passivation mechanism of these so-called tunnel oxide passivated contacts will be outlined and the impact of TCO (transparent conductive oxide) deposition on the injection-dependent lifetime characteristic of the emitter as well as its implications on FF will be discussed. Finally, possible transport paths across the tunnel oxide barrier will be discussed and it will be shown that the passivating oxide layer does not lead to a relevant resistive loss and thus does not limit the solar cell's carrier transport. Contrary to amorphous silicon-based heterojunction solar cells, this structure also shows a good thermal stability and, thus, could be a very appealing option for next generation high-efficiency silicon solar cells.
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