Properties of rf‐sputtered Al2O3 films deposited by planar magnetron

Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation R. S. Nowicki; Properties of rf‐sputtered Al2O3 films deposited by planar magnetron. J. Vac. Sci. Technol. 1 January 1977; 14 (1): 127–133. https://doi.org/10.1116/1.569103 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science and Technology Search Advanced Search |Citation Search