酒石酸
抛光
溶解
水溶液
蚀刻(微加工)
扫描电子显微镜
溴
各向同性腐蚀
固溶体
材料科学
Crystal(编程语言)
成核
半导体
化学成分
分析化学(期刊)
化学
结晶学
化学工程
无机化学
冶金
物理化学
图层(电子)
纳米技术
色谱法
有机化学
复合材料
计算机科学
光电子学
柠檬酸
程序设计语言
工程类
作者
G. P. Malanych,V. N. Tomashyk,I. B. Stratiychuk,Z. F. Tomashyк
标识
DOI:10.1134/s0020168514070097
摘要
The chemical polishing of the surface of single crystals of PbTe and Pb1 − x Sn x Te solid solutions by H2O2-HBr-tartaric acid bromine-releasing etchants has been studied for the first time under reproducible hydrodynamic conditions. The dissolution rate of the crystals has been determined as a function of etchant composition, solution stirring rate, and temperature. The polished surfaces have been examined by microstructural analysis and electron microscopy. We have located the composition boundaries of solutions for the dynamic chemical polishing of the semiconductor materials studied.
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