消光比
多路复用器
绝缘体上的硅
光学
材料科学
光纤布拉格光栅
平版印刷术
光电子学
硅光子学
干涉测量
电子束光刻
光子学
硅
波长
多路复用
物理
抵抗
电子工程
复合材料
工程类
图层(电子)
作者
Md. Ghulam Saber,Zhenping Xing,David Patel,Eslam A. El-Fiky,Nicolás Abadía,Yun Wang,Maxime Jacques,Mohamed H. Morsy-Osman,David V. Plant
出处
期刊:IEEE Photonics Journal
[Institute of Electrical and Electronics Engineers]
日期:2017-05-12
卷期号:9 (3): 1-10
被引量:46
标识
DOI:10.1109/jphot.2017.2703857
摘要
We experimentally and via simulations demonstrate ultracompact single-stage and cascaded optical add-drop multiplexers using misaligned sidewall Bragg grating in a Mach-Zehnder interferometer for the silicon-on-insulator platform. The single-stage configuration has a device footprint of 400 μm × 90 μm, and the cascaded configuration has a footprint of 400 μm × 125 μm. The proposed designs have 3-dB bandwidths of 6 nm and extinction ratios of 25 dB and 51 dB, respectively, and have been fabricated for the transverse electric mode. A minimum lithographic feature size of 80 nm is used in our design, which is within the limitation of 193 nm deep ultraviolet lithography.
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