材料科学
电介质
甲基丙烯酸甲酯
薄膜
电极
收缩率
介电强度
复合材料
聚甲基丙烯酸甲酯
介电损耗
分析化学(期刊)
光电子学
聚合
聚合物
化学
纳米技术
物理化学
色谱法
作者
Alexey Ilin,А. Г. Коваленко,А. В. Фролов,Dmitry Labutov
标识
DOI:10.1109/3m-nano49087.2021.9599759
摘要
The dielectric strength of thin-film cross-linked PMMA was studied. A series of samples was fabricated using EBL. The samples were two overlapping Pd electrodes separated by a layer of cross-linked PMMA. The cross-linking was obtained by high-dose electron-beam irradiation of PMMA thin-film. The size of the overlap was $1\times 1\ \mu \mathrm{m}^{2}$ and the crosslinked PMMA layer thickness was 90 nm. The IV characteristics of the samples were obtained, and the breakdown voltage measured was 32.5 V to 46.6 V with mean value 39.2 V, and median 38.9 V. The calculated dielectric strength of the thin-film cross-linked PMMA was 3.6 MV/cm to 5.2 MV/cm, with mean value 4.4 MV/cm and median 4.3 MV/cm. Additionally, PMMA thin films shrinkage under cross-linking was measured.
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