朗缪尔探针
沉积(地质)
频谱分析仪
等离子体
电离
化学
分析化学(期刊)
等离子体诊断
材料科学
环境化学
离子
物理
核物理学
光学
地质学
古生物学
有机化学
沉积物
作者
Hisashi Kitami,Masaru Miyashita,Toshiyuki Sakemi,Yasushi Aoki,Takanori Kato
标识
DOI:10.7567/jjap.54.01ab05
摘要
The ionization rates of depositing particles in reactive plasma deposition (RPD) were quantitatively investigated using a measurement system composed of a mass-energy analyzer and a Langmuir probe in order to clarify the formation mechanisms of high-quality transparent conductive oxide films. The detection efficiencies of neutral particles and ions in the mass-energy analyzer were calibrated by the Langmuir probe. The species ionization rates were measured during indium tin oxide (ITO) deposition. The ionization rates associated with changes in the deposition chamber pressure were also measured. During ITO deposition, the lower limits of the following ionization rates were determined: indium ionized at a rate of 74–87%, oxygen atoms at 0.5–0.6%, and oxygen molecules at 0.01–0.02%. These rates may increase depending on the pressure in the deposition chamber. This method would also be applicable for measuring general plasma processes.
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