S. D. Brotherton,C. Glasse,C. Glaister,P. Green,Franziska Rohlfing,J. R. Ayres
出处
期刊:Applied Physics Letters [American Institute of Physics] 日期:2004-01-05卷期号:84 (2): 293-295被引量:52
标识
DOI:10.1063/1.1639137
摘要
Results are presented on the performance of low-temperature, short-channel polycrystalline silicon (poly-Si) thin-film transistors (TFTs), with channel length down to 0.5 μm, and scaled gate oxide thickness down to 20 nm. Good TFT switching characteristics were obtained, and the uniformity of short-channel TFTs was shown to have a standard deviation of better then 10%, even for channel widths as small as 4 μm. The 0.5 μm TFTs have been incorporated into a 15-stage complementary pair metal-oxide-Si transistor ring oscillator, which, at a supply voltage of 3 V, operated with a delay/stage of ∼0.1 ns.