材料科学
发射率
电阻率和电导率
极紫外光刻
薄膜
红外线的
复合材料
光电子学
光学
纳米技术
物理
电气工程
工程类
作者
Jeongwoon Hwang,Dongwook Kim,Yeonghun Lee,Taesoon Hwang,Jinho Ahn,Kyeongjae Cho
出处
期刊:NANO
[World Scientific]
日期:2024-03-28
卷期号:19 (06)
标识
DOI:10.1142/s1793292024500206
摘要
A high-infrared (IR) emissivity is required to dissipate heat effectively from high-temperature surfaces even in a near-vacuum environment. This radiative cooling capability is essential for the emissive layer of EUV pellicles operating under high vacuum conditions with increasing EUV source powers to ensure thermomechanical stability. We compute the IR emissivity of metal films by combining the classical oscillator model and DFT calculations. Based on the calculations, we predict a positive correlation between the electrical resistivity and IR emissivity of metal films, which is consistent with a recent experiment on Ru thin films. Our findings can provide a practical indicator for achieving high IR emissivity of metallic thin films based on electrical measurements. This emissivity–resistivity correlation can provide an effective way to search a large material space, and choose and synthesize a highly emissive layer of EUV pellicles.
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