材料科学
锡
钙钛矿(结构)
磁滞
离子
场效应晶体管
碘化物
氢
化学工程
晶体管
光电子学
纳米技术
无机化学
有机化学
冶金
电气工程
凝聚态物理
物理
化学
电压
工程类
作者
Wenshu Yang,Kai Zhang,Wei Yuan,Lijun Zhang,Chuanjiang Qin,Haibo Wang
标识
DOI:10.1002/adma.202313461
摘要
Abstract Ion migration poses a substantial challenge in perovskite transistors, exerting detrimental effects on hysteresis and operational stability. This study focuses on elucidating the influence of ion migration on the performance of tin‐based perovskite field‐effect transistors (FETs). It is revealed that the high background carrier density in FASnI 3 FETs arises not only from the oxidation of Sn 2+ but also from the migration of FA + ions. The formation of hydrogen bonding between FA + and F − ions efficiently inhibits ion migration, leading to a reduction in background carrier density and an improvement in the operational stability of the transistors. The strategy of hydrogen bond is extended to fluorine‐substituted additives to improve device performance. The incorporation of 4‐fluorophenethylammonium iodide additives into FETs significantly minimizes the shift of turn‐on voltage during cyclic measurements. Notably, an effective mobility of up to 30 cm 2 V −1 s −1 with an I on/off ratio of 10 7 is achieved. These findings hold promising potential for advancing tin‐based perovskite technology in the field of electronics.
科研通智能强力驱动
Strongly Powered by AbleSci AI