New Quaternary Amines and Solvents for Photoresist Developing and Stripping Applications

Tetramethylammonium hydroxide (TMAH) and N-methyl pyrrolidinone (NMP) are commonly used in photoresist developing and stripping process, however, both of TMAH and NMP have been confirmed with CMR (Carcinogenic, Mutagenic and Reprotoxic) concerns. With more attention attracted to TMAH and NMP replacements, Huntsman developed a range of new quaternary amines products, including E-GRADE ® Choline OH (Choline Hydroxide), E-GRADE ® THEMAH (Tris (2-hydroxyethyl) methylammonium Hydroxide), XHE-125, XHE-128, XHE-138, XHE-145 and XHE-148, and solvents, E-GRADE ® MEOX (3-Methyl-2-oxazolidinone) and XHE-123, which have been evaluated in comparison with the performance of TMAH and NMP.