Two-inch Fe-doped β-Ga2O3 (010) substrates prepared using vertical Bridgman method

Abstract The growth of large-diameter high-resistivity β -Ga 2 O 3 (010) substrates is important for the low-cost production of lateral Ga 2 O 3 devices. We grew a 2 inch diameter Fe-doped high-resistivity β -Ga 2 O 3 (010) single crystal by using the vertical Bridgman (VB) method, which is expected to grow large-diameter β -Ga 2 O 3 crystals with various crystal orientations. Two-inch substrates were prepared from the obtained crystals, and their crystallinity, concentration of Fe dopants, and electrical properties were investigated. Consequently, a 2 inch β -Ga 2 O 3 (010) substrate, which is comparable to the largest size of (010) substrate prepared using the Czochralski method, was successfully fabricated with the VB method. The in-plane distribution of the X-ray rocking curve from 020 diffraction of the fabricated 2 inch substrate showed that the full widths at half maximums were less than 35 arcsec at almost all measurement points, indicating high crystallinity and high in-plane uniformity. In addition, the crystals contain Fe concentrations in the range of 3.5 × 10 18 –1.9 × 10 19 cm −3 , indicating that impurity Si donors are sufficiently compensated by the Fe dopants. Therefore, substrates prepared using the VB method exhibited high resistivities of 6 × 10 11 –9 × 10 12 Ω·cm at room temperature.