Free‐Radical Polymerization of Liquid Hydroxyethyl Methacrylate Layers Using Nanosecond Plasma Pulses

ABSTRACT Promoting both high functional group preservation and high deposition rates is a major challenge in plasma deposition. This study explores a dynamic method using nanosecond pulsed plasma discharges to polymerize thin liquid layers of 2‐hydroxyethyl methacrylate (HEMA). The influence of plasma pulse frequency (200 ns) and liquid layer thickness on chemical structure retention, polymeric growth, and thin film growth rate is examined. High‐resolution mass spectrometry (HRMS) highlights that plasma curing of liquid monomer layers achieves significantly better chemical structure preservation and polymeric growth, along with deposition rates an order of magnitude higher than traditional vapour‐phase methods. This work provides valuable insights and guidelines for plasma‐induced free‐radical polymerization of liquid layers into functional thin solid films.