异质结
金属有机气相外延
光电子学
材料科学
太阳能电池
外延
电致发光
图层(电子)
纳米技术
作者
Li Gan,Hassanet Sodabanlu,Kentaroh Watanabe,Masakazu Sugiyama,Yoshiaki Nakano
标识
DOI:10.35848/1347-4065/acd9b8
摘要
Abstract The p-Al 0.35 Ga 0.65 As/n-InGaP heterojunction solar cells are promising competitors compared with conventional InGaP or AlGaAs solar cells as the heterogeneous combination can overcome the demerits of each material. However, InGaP has an optimized growth temperature much lower than that of AlGaAs in metal-organic vapor phase epitaxy (MOVPE) growth. Therefore, a challenge arises from oxygen contamination at the hetero-interface during temperature adjustment for obtaining MOVPE-grown high-quality p-AlGaAs/n-InGaP heterojunction. Here we report that a temperature-graded layer (TGL) of AlGaAs can solve the issue of growth temperature mismatch, and significantly improve the voltage performance of AlGaAs/InGaP solar cells. Absolute electroluminescence measurement and atomic force microscopy confirmed a smooth interface with less non-radiative recombination after TGL was applied. The temperature-graded growth is verified able to improve the AlGaAs/InGaP interface quality and provides a scalable method for AlGaAs-based heterogeneous growth.
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