钝化
光致发光
材料科学
等离子体增强化学气相沉积
原位
退火(玻璃)
光电子学
氧化物
铝
分析化学(期刊)
化学气相沉积
化学工程
纳米技术
图层(电子)
复合材料
化学
冶金
有机化学
色谱法
工程类
作者
Anatole Desthieux,Mengkoing Sreng,Pavel Bulkin,Ileana Florea,Etienne Drahi,B. Bazer-Bachi,Jean‐Charles Vanel,François Silva,Jorge Omar Gil Posada,Pere Roca i Cabarrocas
标识
DOI:10.1016/j.solmat.2021.111172
摘要
Abstract An in situ Modulated Photoluminescence (MPL) measurement setup mounted on a Plasma Enhanced Chemical Vapor Deposition (PECVD) reactor is described. A method for deriving the actual minority carrier lifetime at the specific injection level of 1.1015 cm−3 is presented. This tool was used in a case study to monitor the passivation properties of aluminum oxide (AlOx) thin films upon annealing. Interesting kinetics, such as a drop of lifetime at temperatures higher than 250 °C along with a recovery of the lifetime during the cooling phase, are shown. Moreover, these in situ results combined with ex situ studies allowed us to demonstrate the formation a stable high positive fixed charge density in the AlOx layer (+1.1012 cm−2) as a consequence of the combination of annealing and light exposure.
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