Comparison of anionic surfactants dodecylbenzene sulfonic acid and 1,2,4-triazole for inhibition of Co corrosion and study of the mechanism for passivation of the Co surface by dodecylbenzene sulfonic acid

In view of the shortcomings of the corrosion inhibitor in the Co bulk CMP process, the corrosion inhibition efficiency is low, and biological reduction is not easy. In this paper, a low-cost, easily degradable anionic surfactant, dodecylbenzene sulfonic acid (DBSA), is introduced as an inhibitor of Co, and the corrosion inhibition performance is compared with the commonly used inhibitor 1,2,4-triazole (TAZ) by corrosion rate tests, electrochemical methods, quantum chemical parameter calculations and optical/scanning electron microscopy (SEM) images. The results show that DBSA exhibits higher corrosion inhibition performance at the same concentration. This is attributed to the higher activity of DBSA molecules, which makes them more easily adsorb on the Co surface and form a denser film through physical and chemical adsorption. The X-ray photoelectron spectroscopy (XPS) results demonstrate that the addition of DBSA effectively prevents the oxidation of fresh Co to Co2+, thereby inhibiting the complexation reaction and improving the quality of the surface.