拉曼光谱
声子
薄脆饼
弯曲
材料科学
压力(语言学)
半导体
极限抗拉强度
凝聚态物理
光谱学
平面(几何)
分析化学(期刊)
复合材料
化学
光学
纳米技术
光电子学
物理
几何学
哲学
量子力学
色谱法
语言学
数学
作者
Noriyuki Hasuike,Issei Maeda,Sou Isaji,Kenji Kobayashi,Kentaro Ohira,Toshiyuki Isshiki
标识
DOI:10.35848/1347-4065/acc74a
摘要
Abstract To develop high-performance semiconductor devices, it is critical to study the relationship between stress and phonon frequency shifts. We used micro-Raman spectroscopy on a β -Ga 2 O 3 (001) wafer to better understand the relationship. We applied tensile stress to a sample along the [010] direction by bending in the direction normal to the (001) plane. The unbent sample’s Raman spectrum showed 9A g + 4B g phonon modes, which are allowed in the experimental geometry. Although some of these peaks monotonically shifted to the lower frequency side as tensile stress increased, each phonon mode showed a different peak shift. The stress potential values for each phonon mode obtained from our results showed different trends from those of the theoretically calculated values reported in previous studies, suggesting that bending stresses on the (001) plane cause stresses in the (010) plane and along the [010] direction.
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