E-beam metrology and line local critical dimension uniformity of thin dry resist films for high numerical aperture extreme ultraviolet lithography

sponsorship: Part of this manuscript has been previously published in the SPIE Conference Proceedings: Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 1249612 (27 April 2023) 10.1117/12.2658280.13 We would like to acknowledge Joern-Holger Franke from imec for the fruitful discussion and calculating the NILS values. (Metrology, Inspection, and Process Control XXXVII|12496, 1249612)