钝化
薄膜晶体管
材料科学
光电子学
阈值电压
图层(电子)
氧化物薄膜晶体管
晶体管
纳米技术
电压
电气工程
工程类
作者
Jung Bae Kim,Yun-chu Tsai,Rodney Lim,Zhiyuan Wang,Mei Hao,Shengwen Wang,Jung‐Woo Park,Lai Zhao,Marcus Bender,Dong Kil Yim,Soo Young Choi
出处
期刊:ECS transactions
[The Electrochemical Society]
日期:2020-09-08
卷期号:98 (7): 69-78
标识
DOI:10.1149/09807.0069ecst
摘要
Highly stable self-aligned coplanar top-gate InGaZnO (IGZO) thin-film transistors (TFTs) with excellent threshold voltage (Vth) uniformity are developed by optimizing gate insulator film properties and controlling oxygen/hydrogen diffusion into IGZO channel. The TFTs do not show notable negative Vth shift and Vth non-uniformity from channel length 10 µm down to 3 µm. The TFTs also show no notable Vth shift during a humidity test in a chamber at 85°C/85% after deposition of passivation layers or even after 1-µm-thick thin-film encapsulation (TFE) SiNx layer on the top of the passivation layer due to the high quality/low hydrogen 2 nd SiNx passivation layer deposited on the top of 1 st SiOx passivation layer.
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