光催化
分解水
硅
纳米线
硅纳米线
光催化分解水
材料科学
纳米技术
化学
工程物理
环境科学
催化作用
光电子学
物理
生物化学
作者
Dong Liu,Leilei Li,Yang Gao,Chengming Wang,Jun Jiang,Yujie Xiong
标识
DOI:10.1002/anie.201411200
摘要
Abstract Silicon should be an ideal semiconductor material if it can be proven usable for photocatalytic water splitting, given its high natural abundance. Thus it is imperative to explore the possibility of water splitting by running photocatalysis on a silicon surface and to decode the mechanism behind it. It is reported that hydrogen gas can indeed be produced from Si nanowires when illuminated in water, but the reactions are not a real water‐splitting process. Instead, the production of hydrogen gas on the Si nanowires occurs through the cleavage of SiH bonds and the formation of SiOH bonds, resulting in the low probability of generating oxygen. On the other hand, these two types of surface dangling bonds both extract photoexcited electrons, whose competition greatly impacts on carrier lifetime and reaction efficiency. Thus surface chemistry holds the key to achieving high efficiency in such a photocatalytic system.
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