肖特基势垒
光电流
单层
材料科学
工作职能
接触电阻
费米能级
带隙
金属半导体结
肖特基二极管
晶体管
光电子学
凝聚态物理
纳米技术
图层(电子)
电气工程
物理
工程类
电压
量子力学
二极管
电子
作者
Naveen Kaushik,Ankur Nipane,Firdous Basheer,Sudipta Dubey,Sameer Grover,Mandar M. Deshmukh,Saurabh Lodha
摘要
The search of a p-type metal contact on MoS2 has remained inconclusive, with high work function metals such as Au, Ni, and Pt showing n-type behavior and mixed reports of n as well as p-type behavior for Pd. In this work, we report quantitative Schottky barrier heights for Au and Pd contacts to MoS2 obtained by analysing low temperature transistor characteristics and contact resistance data obtained using the transfer length method. Both Au and Pd exhibit n-type behavior on multilayer as well as monolayer MoS2 transistors with Schottky barrier heights of 0.126 eV and 0.4 eV, and contact resistances of 42 Ω.mm and 18 × 104 Ω.mm respectively. Scanning photocurrent spectroscopy data is in agreement with the resulting energy band alignment in Au-MoS2-Pd devices further reinforcing the observation that the Fermi-level is pinned in the upper half of MoS2 bandgap.
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