光学
电子束光刻
平版印刷术
蚀刻(微加工)
二极管
菲涅耳区
发光二极管
材料科学
物理
阴极射线
光电子学
电子
抵抗
纳米技术
衍射
图层(电子)
量子力学
作者
Ivana Lettrichová,Dušan Pudiš,A. Laurenčíková,Peter Gašo,Ľuboš Šušlik,Daniel Jandura,Jozef Novák
摘要
In this contribution, we present modification of far field of light emitting diode (LED) with implemented Fresnel structure in the LED surface. Fresnel structures were prepared in one-dimensional arrangement with two different foci f1 = 12.5 μm and f2 = 1 cm. Structures were etched directly in the LED emitting surface using electron beam lithography with the etched depth for the structure with f1 and f2 app. 200 nm and 400 nm, respectively. Due to application of these structures, LED far field narrowing was observed, which is documented by goniophotometer measurements. For the structure with f1 and f2, the intensity decrease for angles ±30° – ±50° is app. 3-4% and 5-6%, respectively, in comparison to the Lambertian profile.
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