无定形固体
无定形碳
氮化碳
氮化物
超晶格
材料科学
溅射
拉曼光谱
纹理(宇宙学)
基质(水族馆)
表面粗糙度
碳纤维
碳膜
溅射沉积
纳米技术
薄膜
复合材料
光电子学
光学
物理
结晶学
光催化
复合数
化学
有机化学
地质学
人工智能
催化作用
图像(数学)
海洋学
计算机科学
图层(电子)
作者
Ian Widlow,Yip-Wah Chung
标识
DOI:10.1590/s0103-97332000000300004
摘要
This review summarizes our most recent findings in the structure and properties of amorphous and crystalline carbon nitride coatings, synthesized by reactive magnetron sputtering. By careful control of the plasma conditions via proper choice of process parameters such as substrate bias, target power and gas pressure, one can precisely control film structure and properties. With this approach, we were able to produce amorphous carbon nitride films with controlled hardness and surface roughness. In particular, we can synthesize ultrathin (1 nm thick) amorphous carbon nitride films to be sufficiently dense and uniform that they provide adequate corrosion protection for hard disk applications. We demonstrated the strong correlation between ZrN(111) texture and hardness in CNx/ZrN superlattice coatings. Raman spectroscopy and near-edge x-ray absorption show the predominance of sp³-bonded carbon in these superlattice coatings.
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