Low pressure chemical vapour deposition of CNx layers by interaction between tetramethylguanidine and cyanurchloride

Possibilities are demonstrated for synthesis of CN x layers in a LPCVD reactor, using liquid and solid state source organic compounds. The influence of pressure and deposition temperature on the composition, structure and physico-chemical properties of the films is investigated. It is found that at a temperature range of 400-600 °C, the layers obtained are transparent, colored on silicon, with good adhesion, homogeneous in morphology and uniform in thickness. Peculiar features of coatings are their amorphous nature, nitrogen to carbon relation 0.76 as well as possible hydrogen incorporation.