Nanostructure fabrication using nanosphere lithography for photonics devices
作者
Jinsong Wang,Guangzhao Mao,Yang Zhao
标识
DOI:10.1109/cleo.2006.4628624
摘要
We use the self-assembled polystyrene nanosphere monolayer pattern to replace photoresist mask for the fabrication of 2D nanostructures on various substrates. The optical properties of these artificial structures are measured and compared with theoretical calculation.