材料科学
光电子学
氮化物
发光二极管
基质(水族馆)
铝
二极管
激光器
波长
氮化镓
半导体
纳米技术
光学
冶金
海洋学
物理
地质学
图层(电子)
作者
Robert T. Bondokov,Sean P. Branagan,Naoki Ishigami,James R. Grandusky,T. Nagatomi,Kazuo Tatsuta,Thomas Miebach,Jianfeng Chen
出处
期刊:Meeting abstracts
日期:2021-10-19
卷期号:MA2021-02 (34): 985-985
标识
DOI:10.1149/ma2021-0234985mtgabs
摘要
Aluminum Nitride (AlN) is an Ultra-wide Bandgap (UWBG) semiconductor that attracts significant interest for its potential application for high power switches, high power density, high frequency and high operating temperature for rf. Currently, AlN substrates are being used for ultraviolet (UV) light emitters at wavelengths shorter than 300nm including UVC Light Emitting Diodes (UVC LED) as well as laser diodes. Successful commercialization of the aluminum nitride as an UWBG substrate depends on several factors such as substrate availability, size, quality, and cost. Here we report on the current status of the bulk growth of AlN single-crystals as well as their subsequent processing for making substrates.
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