Interface Engineering Using Multiple La-Doped HfO 2 Epitaxial Subnanolayers To Improve the Ferroelectric Properties of Hf 0.5 Zr 0.5 O 2 Films

%, not related to the ferroelectric response, are also observed. These findings underscore multilayer architecture as an interesting approach to improve properties while also showing that careful selection of interlayer composition is critical to improve device performance.