材料科学
介电谱
接触角
等离子体增强化学气相沉积
腐蚀
扫描电子显微镜
涂层
硅氧烷
傅里叶变换红外光谱
铜
薄膜
合金
基质(水族馆)
复合材料
化学工程
分析化学(期刊)
冶金
纳米技术
电化学
电极
化学
海洋学
物理化学
色谱法
地质学
工程类
聚合物
作者
Yasmin A. El-Moaz,Wafaa A. Mohamed,Mai M. Rifai,Nasser N. Morgan,Khaled H. Metwally,Nabil A. Abdel Ghany
标识
DOI:10.1007/s11665-023-07990-7
摘要
Abstract In this study, siloxane has been used for the protection of metal artifacts from corrosion in the form of transparent barrier coating films because of their good adhesion to the metal substrate. The effect of oxygen plasma pre-treatment on the adhesion properties of the siloxane thin film on the silver-copper alloy substrate was investigated. Radiofrequency plasma-enhanced chemical vapor deposition (RF-PECVD) was used for the deposition process. Surface identification and characterization of the deposited films were carried out using Scanning Electron Microscopy coupled with energy-dispersive x-ray spectroscopy (SEM–EDX) and Fourier-transform infrared spectroscopy (FT-IR). Surface topography and roughness were investigated by atomic force microscopy (AFM). The hydrophobic characteristic was measured by water contact angle measurement (WCA). The film thickness was evaluated using a spectroscopic ellipsometer (SE). Colorimetric measurement (CM) was used to evaluate changes in the appearance of the surface following the PECVD deposition of the SiO 2 protective layer. The corrosion protection ability of siloxane films for metal substrates as a function of RF power and gas feed composition was examined by the electrochemical impedance spectroscopy (EIS) technique. It was found that the deposited film improved the protective efficiency for samples from 55.29 to 92.93%. Besides, after the oxygen plasma pretreatment step, the film showed better corrosion resistance of the tested samples.
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