薄脆饼
锗
腐蚀
硅
光电子学
材料科学
冶金
化学
纳米技术
作者
Philippe Garnier,C. de Buttet
摘要
Fluorinated chemistries can lead to severe corrosion damage towards silicon and germanium based materials when wafers have a significant amount of electrostatic charges. This corrosion is evidenced on both single wafer and batch tools. It can be prevented by the presence of enough light, and wafer charging can also be eradicated by photo emission with UV light.
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