稳健性(进化)
绝缘栅双极晶体管
缩放比例
双极结晶体管
计算机科学
电子工程
晶体管
材料科学
电气工程
电压
化学
数学
工程类
几何学
生物化学
基因
作者
Xiang Zhou,Wataru Saito,Toshiro Hiramoto
标识
DOI:10.35848/1347-4065/adb5e3
摘要
Abstract Robustness under high-temperature Unclamped Inductive Switching (UIS) tests was systematically compared among 3300 V scaled Insulated Gate Bipolar Transistors (IGBTs) using TCAD simulations, with scaling factors (k) ranging from 1 to 10. Based on multiple lines of physical evidence, the failure mechanism of IGBTs during the UIS test was identified as a latch-up. A slight degradation in UIS robustness was observed in fully scaled IGBTs, as evaluated using a novel reliability comparison method. Moreover, certain non-proportional scaling techniques were shown to mitigate this degradation, with some approaches even surpassing the UIS robustness of the original (k = 1) IGBT design.
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