Synthesis Conditions and Properties of SiAlCN Coatings Obtained by Reactive Evaporation of Al in a Hollow Cathode Arc Discharge in Hexamethyldisilazane Vapors

SiAlCN coatings were first obtained by the method of reactive evaporation of aluminum and plasma chemical activation of an organosilicon precursor in a hollow cathode arc discharge. The spectrum of discharge plasma was studied by optical emission spectroscopy under conditions of evaporation of Al in an Ar+N2+hexamethyldisilazane vapor/gas medium, and it was shown that in the presence of a metal component in the plasma, not only did intensive activation of various components of the media occur but also an increased ionic effect on the surface of the coating was provided, with a deposition rate of up to 10.1 µm/h. The films had a dense and homogeneous structure and had a hardness of up to 31 GPa and good adhesion on stainless steel. The results of SEM, FTIR, and XRD showed that their structure was a nanocomposite consisting of an amorphous matrix based on SiCN and AlN with inclusions of AlCN nanocrystals.