石墨烯
材料科学
拓扑绝缘体
自旋电子学
X射线光电子能谱
异质结
拓扑(电路)
表面状态
硫族元素
纳米技术
凝聚态物理
光电子学
铁磁性
结晶学
曲面(拓扑)
核磁共振
物理
化学
数学
几何学
组合数学
作者
Regina Galceran,Frédéric Bonell,Lorenzo Camosi,Guillaume Sauthier,Zewdu M. Gebeyehu,M.J. Esplandiu,Aloïs Arrighi,Iván Fernández Aguirre,A. I. Figueroa,Juan F. Sierra,Sergio O. Valenzuela
标识
DOI:10.1002/admi.202201997
摘要
Abstract The investigation, and ultimate application, of topological insulators, typically involve exposure to ambient conditions or their integration with metals, which lead to surface oxidation or material intermixing. X‐ray photoelectron spectroscopy (XPS) measurements that demonstrate passivated and intermixing‐free interfaces in the topological insulator Bi 2 Te 3 by means of dry‐transferred CVD graphene are reported. After air exposure, no traces of Bi 2 Te 3 oxidation are found. Furthermore, it is demonstrated that graphene acts as a very efficient metal and chalcogen diffusion barrier in Bi 2 Te 3 /graphene/permalloy (Py) heterostructures, which are relevant for spintronics. Such results are in stark contrast with the significant surface degradation observed in bare Bi 2 Te 3 under ambient conditions and the deep BiTe bonding disruption that occurs in Bi 2 Te 3 /Py heterostructures. These findings provide a new approach to control and engineer topological insulator interfaces for spintronic applications and a new platform to investigate the combined use of graphene and topological insulator Dirac states.
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