稳健性(进化)
材料科学
汽车工业
击穿电压
硼
电压
电气工程
光电子学
离子
物理
工程类
化学
核物理学
生物化学
量子力学
基因
热力学
作者
Yoshiya Kawashima,Hiroaki Inomata,Koichi Murakawa,Y. Miura
摘要
We report on ultra-low on-resistance 40–60 V-class n-channel superjunction UMOSFET (SJ-UMOS) with sufficient robustness for automotive applications. In the newly developed SJ-UMOS, we design a leading minimal pitch SJ structures with sub-micron wide p-type regions fabricated by high-energy multiple ion implantations of boron. This structure drastically improves the tradeoff between on-resistance and breakdown voltage (V B ), which has limited the performance of conventional SJ-UMOS. Record low specific on-resistance (R SP ) of 9.1 mΩmm2 and 16.1 mΩmm2 (V GS = 10 V) are obtained for V B of 44.8 V and 61.0 V, respectively. We also confirm high avalanche immunity for the chips showing the best performance.
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