A Fully Realized `Field Balanced' TrenchMOS Technology
作者
Steven T. Peake,Phil Rutter,S.W. Hodgskiss,Mark Gajda,Neil Irwin
标识
DOI:10.1109/ispsd.2008.4538889
摘要
This paper presents an optimized low voltage Power MOSFET technology with a specific on-state resistance that surpasses that previously achievable with conventional TrenchMOS structures. Typical specific on- state resistances of 5.4 mOmega mm 2 and 8.9 mOmega mm 2 (plusmn0.8 mOmega mm 2 ) for avalanche voltages of 26.5V and 35.5V respectively have been achieved. These values compare favorably with the specific on-state resistances recently reported for the more complex charge-balanced (RESURF) structures.