Migration of noble gas atoms in interaction with vacancies in silicon

First principles calculations in combination with the nudged elastic band method have been performed in order to determine the mobility properties of various noble gas species (He, Ne, Ar, Kr, and Xe) in silicon, a model semiconducting material. We focussed on single impurity, in interstitial configuration or forming a complex with a mono- or a di-vacancy, since the latter are known to be present and to play a key role in the formation of extended defects like bubbles or platelets. We determined several migration mechanisms and associated activation energies and have discussed these results in relation to available experiments. In particular, conflicting measured values of the migration energy of helium are explained by the present calculations. We also predict that helium diffuses solely as an interstitial, while an opposite behaviour is found for heavier species such as Ar, Kr, and Xe, with the prevailing role of complexes in that case. Finally, our calculations indicate that extended defects evolution by Ostwald ripening is possible for helium and maybe neon, but is rather unlikely for heavier noble gas species.