A Structure Design of Novel Photobase Generator and Application of a Photobase Generator to Negative Photosensitive Polyimides

AStruCtureDeslgnOfNovelPhotobaseGenerator andApplicationofaPhotobaseGenerator toNegativePhotosensitivePolyimidesYujiKatayama ‡，TbshiakiNagasawaandHideakiTAkahashi ．-h(J／7ト〟(J．Yピ／Hルp肌J／／(川C川／J・(J／尺度β⊥rJわ(肌′／。′・／… ノーJ滋J／呵／血(JFJ小一ぐ叶∫／才と〃0転読ィ，〃〃 払Jqγα∽α．γん＠0桝．α∫α鋸一転∫e-．cotか Key words：Photobase generator POlyamicacid Polyimides(PIs)areusedasengineeQng PlasticsbecauseoftheirexcellentmechanlCal PrOPerties．PIsare叩Pliedforphotosensitive materials，i．e．photosensitive polyimides (PSPIs)．Most of PSPIs are negative-tyPe Photosensitive materials with crosslinked SyStem Which needs high temperature cure PrOCeSStOremOVeCrOSSlinksites． However those systems are difncult to applyforphotosensitivecoverlaylnregardsof flexibleprintedcircuit(FPC)thatisdamaged agalnSthightemperaturecureprocess・ PIsaresynthesizedfrompolyamicacids (PAAs)precursors under base catalyst COndition． Therefbre we have adopted Photobasegenerators(PBGs)asacatalystof PAA．We have developed the PBGsfor alkaline developable negative-tyPe PSPI (Schemel，Figl)． 2．Experimenta1 2-1．SynthesisofPhotoBaseGenerators IPh-BAwaspreparedasdescribedinthe literature．［1］［2］C8was prepared by the following patent．［3］C7M，C8M，C7MPh， C8MPh，TX-8Werepreparedasdescribedin Scheme 2-6．The abbreviationsin Scheme 2-6 are as follows：MeMgI(Methyl magnesiumiodide)，PTSA(p-tOluenesulfonlC acid)，NaIO4(Sodium periodate)，RuC13 (Ruthenium(III)chloride)，NH20H・HCl (Hydroxylamine hydrochloride)， TCBC (Tricholorobenzoylchloride)， DMAP (Dimethylaminopyrine)，NEt3(Triethylamine)，